Singapore
FPA-6000ES6a
Single-stage lithography tools designed with the lowest print limit of 90nm
Designed for volume production, the FPA-6000ES6a is a step-and-scan semiconductor system, with a 0.86 NA and a single-stage lithography tool. In addition it comes built with the highest NA KrF lens in the industry.
- Resolution: 90 nm
- Numerical aperture: 0.55 ∼ 0.86
- Wafer size: 300 mm, 200 mm
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