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ArF (193 nm) scanning steppers
World's highest NA, capable of sub-45nm resolution for high-volume production
- Resolution: ≤ 45 nm
- Numerical aperture: 0.85 ∼ 1.35
- Wafer size: 300 mm
World's highest "dry" NA, capable of sub-650nm resolution for high-volume production
- Resolution: ≤ 65 nm
- Numerical aperture: 0.60 ∼ 0.93
- Wafer size: 300 mm
KrF (248 nm) scanning steppers
Single-stage lithography tools designed with the lowest print limit of 90nm
- Resolution: 90 nm
- Numerical aperture: 0.55 ∼ 0.86
- Wafer size: 300 mm, 200 mm
Exceptional imaging performance – with high intensity and high uniformity illumination system
- Resolution: 110 nm
- Numerical aperture: 0.55 ∼ 0.80
- Wafer size: 300 mm, 200 mm
i-line (365 nm) scanning steppers
Enhanced throughput with stability requirements for memory manufacturing
- Resolution: ≤ 0.35 µm
- Numerical aperture: 0.45 ∼ 0.57
- Wafer size: 300 mm
A perfect mix-and-match for 200mm and 800mm DUV scanners
- Resolution: ≤ 0.28 µm
- Numerical aperture: 0.45 ∼ 0.57
- Wafer size: 300 mm, 200 mm
A solution for CCD / LCD production
- Resolution: 0.50 µm
- Numerical aperture: 0.28 ∼ 0.37
- Wafer size: 300 mm, 200 mm
High productivity partner
- Resolution: ≤ 0.35 µm
- Numerical aperture: 0.45 ∼ 0.63
- Wafer size: 200 mm, 150 mm
Data shown may be approximations. See product specifications for details.
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